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Substrate Dependence of Structural and Transport Properties in FeSe0.5Te0.5 Thin Films
Masafumi Hanawa1,5,
Ataru Ichinose1,5,
Seiki Komiya1,5,
Ichiro Tsukada1,5,
Takanori Akiike2,5,
Yoshinori Imai2,5,
Tatsuo Hikage3,
Takahiko Kawaguchi4,5,
Hiroshi Ikuta4,5, and
Atsutaka Maeda2,5
1Central Research Institute of Electric Power Industry, Yokosuka, Kanagawa 240-0196, Japan
2Department of Basic Science, The University of Tokyo, Meguro, Tokyo 153-8902, Japan
3High Intensity X-ray Diffraction Laboratory, Nagoya University, Nagoya 464-8603, Japan
4Department of Crystalline Materials Science, Nagoya University, Nagoya 464-8603, Japan
5Transformative Research Project on Iron Pnictides (TRIP), Japan Science and Technology Agency, Chiyoda, Tokyo 102-0075, Japan
(Received January 5, 2011; revised February 22, 2011; accepted February 27, 2011; published online May 20, 2011)
In order to clarify the best condition for the growth of iron chalcogenide superconductor thin films, we investigated the effect of the substrate on the transport and structural properties of films. Thin films of FeSe0.5Te0.5 grown by pulsed laser deposition were characterized by DC electrical resistivity, Hall effect, X-ray diffraction measurements, and transmission electron microscopy (TEM) observation. The c-axis length of the FeSe0.5Te0.5 thin films revealed a non-systematic change with the cell constants of the substrates. In the films with poor or no superconductivity, we found the occurrence of oxygen penetration to the film and the formation of amorphous layer between the film and the substrate. The origin of the oxygen penetration and the amorphous layer was the chemical properties of substrate. From the chemical viewpoint, LaAlO3 and MgO substrates were confirmed to be appropriate to grow FeSe0.5Te0.5 films.
URL:
http://jjap.jsap.jp/link?JJAP/50/053101/
DOI: 10.1143/JJAP.50.053101
PACS: 74.78.-w, 81.15.Fg, 74.62.Bf
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