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Improving Single-Chamber Solid Oxide Fuel Cell Performance by Plasma Treatment Using an Atmospheric-Pressure Helium Plasma Jet

Seiji Kanazawa, Tadasuke Iwao, Shuichi Akamine, and Ryuta Ichiki

Department of Electrical and Electronic Engineering, Oita University, Oita 870-1192, Japan

(Received November 10, 2010; revised February 21, 2011; accepted February 22, 2011; published online August 22, 2011)

An atmospheric-pressure helium plasma jet was used for the surface treatment of the electrodes in single-chamber solid oxide fuel cells (SC-SOFCs). The jet-type plasma source used in this study is suitable for the continuous and fine-area processing of materials, such as patterned electrodes. The basic plasma property was investigated by optical emission spectroscopy. Improvement in the performance of SC-SOFC was observed for the plasma-treated cell. From the scanning electron microscopy (SEM) observation, it was found that the surface morphology of the cell was largely changed. The increase in the area of the three-phase boundary among the electrode, electrolyte, and gas phase promoted electrochemical reactions. Under single-chamber operation condition at 850 °C, an open circuit voltage of 650 mV and a maximum power density of approximately 75 mW/cm2 were achieved for a coplanar-type cell.

URL: http://jjap.jsap.jp/link?JJAP/50/08KA04/
DOI: 10.1143/JJAP.50.08KA04
PACS: 82.47.Ed, 52.77.-j, 68.37.Hk, 68.55.-a


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References

  1. T. Hibino and H. Iwahara: Chem. Lett. 22 (1993) 1131.
  2. T. Hibino, K. Ushiki, and Y. Kuwahara: Solid State Ionics 91 (1996) 69.
  3. T. Hibino, A. Hashimoto, T. Inoue, J. Tokuno, S. Yoshida, and M. Sano: Science 288 (2000) 2031[Science].
  4. I. Riess, P. J. van der Put, and J. Schoonman: Solid State Ionics 82 (1995) 1.
  5. J. G. Wang, C. J. Liu, Y. P. Zhang, X. L. Zhu, J. Zou, K. L. Yu, and B. Eliasson: Chem. Lett. 31 (2002) 1068.
  6. Z. H. Li, S. X. Tian, H. T. Wang, and H. B. Tian: J. Mol. Catal. A 211 (2004) 149.
  7. R. Sharma, R. D. Rimmer, J. Gunamgari, R. S. Shekhawat, B. J. Davis, M. K. Mazumder, and D. A. Lindquist: IEEE Trans. Ind. Appl. 41 (2005) 1373.
  8. J. Y. Jeong, S. E. Babayan, A. Schütze, V. J. Tu, J. Park, I. Henins, G. S. Selwyn, and R. F. Hicks: J. Vac. Sci. Technol. A 17 (1999) 2581[AIP Scitation].
  9. S. E. Babayan, J. Y. Jeong, A. Schutze, V. J. Tu, M. Moravej, G. S. Selwyn, and R. F. Hicks: Plasma Sources Sci. Technol. 10 (2001) 573[IoP STACKS].
  10. C. Tendero, C. Tixier, P. Tristant, J. Desmaison, and P. Leprince: Spectrochim. Acta, Part B 61 (2006) 2.
  11. V. Raballand, J. Benedikt, S. Hoffmann, M. Zimmermann, and V. von Keudell: J. Appl. Phys. 105 (2009) 083304[AIP Scitation].
  12. X. Zhang, J. Huang, X. Liu, L. Peng, L. Guo, G. Lv, W. Chen, K. Feng, and S. Z. Yang: J. Appl. Phys. 105 (2009) 063302[AIP Scitation].
  13. S. Ikawa, K. Kitano, and S. Hamaguchi: Plasma Processes Polym. 7 (2010) 33.
  14. T. Yuji, H. Akatsuka, N. Mungkung, B. W. Park, and Y. M. Sung: Vacuum 83 (2009) 124.
  15. Y. Teramoto, T. Shiono, R. Ono, and T. Oda: Denki Gakkai Ronbunshi A 130 (2010) 525 [in Japanese].
  16. T. Ishihara, T. Akbay, H. Furutani, and Y. Takita: Solid State Ionics 113–115 (1998) 585.
  17. F. Mitsugi, S. Kanazawa, T. Ohkubo, Y. Nomoto, T. Ishihara, and Y. Takita: Jpn. J. Appl. Phys. 43 (2004) 299[JSAP].
  18. T. Ishihara, J. Tabuchi, S. Ishikawa, J. Yan, M. Enoki, and H. Matsumoto: Solid State Ionics 177 (2006) 1949.
  19. M. Teschke, J. Kedzierski, E. G. Finantu-Dinu, D. Korzec, and J. Engemann: IEEE Trans. Plasma Sci. 33 (2005) 310.
  20. J. L. Walsh, F. Iza, N. B. Janson, V. J. Law, and M. G. Kong: J. Phys. D 43 (2010) 075201[IoP STACKS].
  21. W. C. Zhu, Q. Li, X. M. Zhu, and Y. K. Pu: J. Phys. D 42 (2009) 202002[IoP STACKS].
  22. Y. Xian, X. Lu, Z. Tang, Q. Xiong, W. Gong, D. Liu, Z. Jiang, and Y. Pan: J. Appl. Phys. 107 (2010) 063308[AIP Scitation].
  23. K. Fricke, H. Steffen, T. von Woedtke, K. Schroder, and K. D. Weltmann: Plasma Processes Polym. 8 (2011) 51.
  24. C. Zhang, Y. Lin, R. Ran, and Z. Shao: Int. J. Hydrogen Energy 35 (2010) 8171.
  25. I. Riess: Solid State Ionics 176 (2005) 1667.
  26. D. Rotureau, J. P. Viricelle, C. Pijolat, N. Caillol, and M. Pijolat: J. Eur. Ceram. Soc. 25 (2005) 2137.
  27. B. E. Buergler, M. Ochsner, S. Vuillemin, and L. J. Gauckler: J. Power Sources 171 (2007) 310.
  28. S. J. Ahn, Y. B. Kim, J. Moon, J. H. Lee, and J. Kim: J. Power Sources 171 (2007) 511.
  29. M. Kuhn, T. W. Napporn, M. Meunier, and D. Therriault: Solid State Ionics 181 (2010) 332.
  30. H. Kim, S. H. Choi, J. Kim, H. W. Lee, H. Song, and J. H. Lee: J. Mater. Process. Technol. 210 (2010) 1243.

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