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Bidirectional Two-Terminal Switching Device for Non-Volatile Random Access Memory
Gyu-Hyun Kil,
Hyung-Jun Yang,
Gae-Hun Lee,
Seong-Hyun Lee, and
Yun-Heub Song
Department of Electronic Engineering, Hanyang University, Seoul 133-791, Korea
(Received September 24, 2011; accepted December 2, 2011; published online April 20, 2012)
A two-terminal N+/P/N+ Si junction device that can replace the conventional selective transistor was studied as a bilateral switching device for spin transfer torque magnetic random access memory (STT-MRAM), by three-dimensional device simulation. An N+/P/N+ junction structure with 30×30 nm2 area provides sufficient bidirectional current flow to write data by a drain-induced barrier lowering (DIBL) under a reverse bias at the N+/P (or P/N+) junction, and high current on/off ratio of 106, which is acceptable for STT-MRAM. In this work, critical parameters such as P-length, P doping, and N+ doping are investigated to elucidate the optimal parameter condition in view of write current and current on/off ratio.
URL:
http://jjap.jsap.jp/link?JJAP/51/04DJ02/
DOI: 10.1143/JJAP.51.04DJ02
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