Jpn. J. Appl. Phys. 51 (2012) 04DN04 (4 pages)  |Previous Article| |Next Article|  |Table of Contents|
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Plasma Treatment to Improve Chemical Vapor Deposition-Grown Graphene to Metal Electrode Contact

Taesoo Kwon, Hyosub An, Young-Soo Seo, and Jongwan Jung

(Received September 25, 2011; accepted December 12, 2011; published online April 20, 2012)

We show that contact properties of chemical vapor deposition (CVD)-grown graphene to metal electrode can be improved with Ar plasma treatment before metal electrode deposition. The Ar plasma treatment reduced the baseline signal of the Raman spectrum of graphene without changing main peaks of 2D and G peak and increasing D peak, supporting its effectiveness to reduce the polymer residue. Transfer length method (TLM) patterns for the plasma-treated samples exhibit more linear and neat current–voltage curve, and lower contact resistance compared with the control one (no plasma treated sample). These results support that plasma treatment is effective to improve the graphene–metal contact properties by reducing interface polymer residue.

URL: http://jjap.jsap.jp/link?JJAP/51/04DN04/
DOI: 10.1143/JJAP.51.04DN04

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