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Jpn. J. Appl. Phys. 51 (2012) 06FJ02 (5 pages)  |Previous Article| |Next Article|  |Table of Contents|
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Imprinted Pattern Profile-Dependent Optical Properties of Metal Nanostructures

Jun-Hyuk Choi, Seong-Je Park, Ji-Hye Lee, Chul-Hyun Kim, Jun-Ho Jeong, Dae-Geun Choi, Eung-Sug Lee, and Jong-Ryul Jeong1

Department of Nanomechanical System, Korea Institute of Machinery and Materials, Daejeon 305-343, Republic of Korea
1Department of Materials Science and Engineering, Graduate School of Green Energy Technology, Chungnam National University, Daejeon 305-764, Republic of Korea

(Received November 20, 2011; accepted February 14, 2012; published online June 20, 2012)

As-imprinted right-edged pillar structures were reconfigured into a tapered sidewall profile by CHF3-based reactive ion etch. The transmittance spectra improved as the sidewall became more tapered for longer etch times. The effect was most distinctive (28.4%) in the transmittance trench zone at wavelengths from 460 to 470 nm owing to the reduced diffraction scattering loss. The transmittance enhancement for silver-coated corrugated nanostructures was even greater (57.0%) for a tapered sidewall structure, in close agreement with the predictions of simulations. The infrared transmittance was notably reduced compared with that in the UV–visible zone, suggesting the possible applications of the structures in heat-insulated windows.

URL: http://jjap.jsap.jp/link?JJAP/51/06FJ02/
DOI: 10.1143/JJAP.51.06FJ02


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