Jpn. J. Appl. Phys. 6 (1967) pp. 963-971  |Table of Contents|
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An Electron Beam Method of Measuring Resistivity Distribution in Semiconductors

Chusuke Munakata

Articles citing this article

The list of citing articles is based on data provided by CrossRef Cited-by Linking. Any errors or omissions are the responsibility of the primary publisher.

1. Japanese Journal of Applied Physics 26 (1987) 2033

   Sample Thickness Dependence of Minority Carrier Lifetimes Measured Using an ac Photovoltaic Method

   Noriaki Honma and Chusuke Munakata

2. Japanese Journal of Applied Physics 23 (1984) 1451

   Ac Surface Photovoltages in Strongly-Inverted Oxidized p-Type Silicon Wafers^*

   Chusuke Munakata, Shigeru Nishimatsu, Noriaki Honma and Kunihiro Yagi

3. Journal of Microscopy 135 (1984) 255

   An improved detection system for electrical microcharacterization in a scanning electron microscope

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4. Scanning 6 (1984) 3

   A low energy electron beam annealing system: Design, capability and use

   M. N. Kozicki, A. R. Dinnis, and J. M. Robertson

5. Japanese Journal of Applied Physics 21 (1982) 624

   Observation of p-n Junctions with a Flying-Spot Scanner Using a Chopped Photon Beam

   Chusuke Munakata, Kunihiro Yagi, Terunori Warabisako, Mitsuo Nanba and Sunao Matsubara

6. physica status solidi (a) 71 (1982) 429

   Determination of local parameters of p–n junctions using the EBIV mode of SEM

   E. I. Rah, A. Y. Sasov, G. W. Spivak, J. Dziesiaty, and K. Wencel

7. Japanese Journal of Applied Physics 11 (1972) 869

   Effect of the Surface Recombination Velocity on the β-Conductive Signal

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8. Journal of Physics D Applied Physics 5 (1972) 1000

   Improvement of the $\beta$-conductive method of measuring electric field intensity in semiconductors by a pulsed electron beam

   C Munakata

9. Japanese Journal of Applied Physics 8 (1969) 1307

   Measurement of Resistance by Means of Electron Beam -III-

   Chusuke Munakata and Hiroshi Watanabe

10. Japanese Journal of Applied Physics 7 (1968) 1051

    Voltage Signal due to Electron-Beam-Induced Conductivity in Semiconductors

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11. Journal of Physics E Scientific Instruments 1 (1968) 639

    An application of beta conductivity to measurement of resistivity distribution

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