Jpn. J. Appl. Phys. 17 (1978) Supplement 17-2 pp. 217-220 |Previous Article| |Next Article| |Table of Contents|
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Int. Conf. X-Ray and XUV Spectroscopy, Sendai, 1978
Surface EXAFS Studies Using Electron Yield Spectroscopy: Oxygen on Ni (100)
Stanford Synchrotron Radiation Laboratory, Stanford University, Stanford, California 94305 USA
Surface extended X-ray absorption fine structure (EXAFS) measurements are discussed which utilize monochromatic synchrotron radiation in the 300–1000 eV range and employ the surface sensitive electron yield detection technique. Results are presented for the O K-edge (∼535 eV) EXAFS of a monolayer of oxygen adsorbed on a Ni (100) surface.