Jpn. J. Appl. Phys. 19 (1980) Supplement 19-1 pp. 15-22  |Previous Article| |Next Article|  |Table of Contents|
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11th Conf. (1979 Int.) Solid State Devices, Tokyo, 1979

(Invited) Basic Technology for VLSI

Yasuo Tarui

This paper describes some of the results of recent work in the fields of microfabrication technology and crystal technology at the VLSI Cooperative Laboratories. Concerning microfabrication technology, three types of EB pattern delineators are described, along with a pair of step and repeat UV projection systems, and a 1:1 deep UV scanning projection system. Some of the results of research on EB projection, X-ray projection and EB resist are also described. Concerning crystal technology, research centering on crystal warpage, microdefects and their relations to impurities is discussed.

URL: http://jjap.jsap.jp/link?JJAPS/19S1/15/